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This is intended as a (very) brief introduction to some of
the common x-ray diffraction techniques used in materials
characterization. It is designed for people who are novices
in this field but are interested in using the techniques in
their research. Extensive and authoritative discussions can
be found in the numerous books and journal articles on this
subject. Some references are listed below.
- Elements of Modern X-ray Physics,
by Jens Als-Nielsen and Des McMorrow, John Wiley & Sons,
Ltd., 2001 (Modern x-ray physics & new developments)
- X-ray Diffraction,
by B.E. Warren, General Publishing Company, 1969, 1990 (Classic
x-ray physics book)
- Elements of X-ray Diffraction,2nd
Ed., by B.D. Cullity, Addison-Wesley, 1978 (Covers
most techniques used in traditional material characterization)
- High Resolution X-ray Diffractometry
and Topography, by D. Keith Bowen and Brian K.
Tanner, Taylor & Francis, Ltd., 1998 (Semiconductors
and thin film analysis)
- Modern Aspects of Small-Angle
Scattering, by H. Brumberger, Editor, Kluwer
Academic Publishers, 1993 (SAXS techniques)
- Principles of Protein X-ray
Crystallography, by Jan Drenth, Springer, 1994
(Crystallography)
X-rays are electromagnetic radiation with typical photon
energies in the range of 100 eV - 100 keV. For diffraction
applications, only short wavelength x-rays (hard x-rays) in
the range of a few angstroms to 0.1 angstrom (1 keV - 120
keV) are used. Because the wavelength of x-rays is comparable
to the size of atoms, they are ideally suited for probing
the structural arrangement of atoms and molecules in a wide
range of materials. The energetic x-rays can penetrate deep
into the materials and provide information about the bulk
structure.
X-rays are produced generally by either x-ray tubes or synchrotron
radiation. In a x-ray tube, which is the primary x-ray source
used in laboratory x-ray instruments, x-rays are generated
when a focused electron beam accelerated across a high voltage
field bombards a stationary or rotating solid target. As electrons
collide with atoms in the target and slow down, a continuous
spectrum of x-rays are emitted, which are termed Bremsstrahlung
radiation. The high energy electrons also eject inner shell
electrons in atoms through the ionization process. When a
free electron fills the shell, a x-ray photon with energy
characteristic of the target material is emitted. Common targets
used in x-ray tubes include Cu and Mo, which emit 8 keV and
14 keV x-rays with corresponding wavelengths of 1.54 Å and
0.8 Å, respectively. (The energy E of a x-ray photon and it's
wavelength is related by the equation E = hc/l, where h is Planck's constant and c
the speed of light)
In recent years synchrotron facilities have become widely
used as preferred sources for x-ray diffraction measurements.
Synchrotron radiation is emitted by electrons or positrons
travelling at near light speed in a circular storage ring.
These powerful sources, which are thousands to millions of
times more intense than laboratory x-ray tubes, have become
indispensable tools for a wide range of structural investigations
and brought advances in numerous fields of science and technology.
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X-rays primarily interact with electrons in atoms. When x-ray
photons collide with electrons, some photons from the incident
beam will be deflected away from the direction where they
original travel, much like billiard balls bouncing off one
anther. If the wavelength of these scattered x-rays did not
change (meaning that x-ray photons did not lose any energy),
the process is called elastic scattering (Thompson Scattering)
in that only momentum has been transferred in the scattering
process. These are the x-rays that we measure in diffraction
experiments, as the scattered x-rays carry information about
the electron distribution in materials. On the other hand,
In the inelastic scattering process (Compton Scattering),
x-rays transfer some of their energy to the electrons and
the scattered x-rays will have different wavelength than the
incident x-rays.
Diffracted waves from different atoms can interfere with
each other and the resultant intensity distribution is strongly
modulated by this interaction. If the atoms are arranged in
a periodic fashion, as in crystals, the diffracted waves will
consist of sharp interference maxima (peaks) with the same
symmetry as in the distribution of atoms. Measuring the diffraction
pattern therefore allows us to deduce the distribution of
atoms in a material.
The peaks in a x-ray diffraction pattern are directly related
to the atomic distances. Let us consider an incident x-ray
beam interacting with the atoms arranged in a periodic manner
as shown in 2 dimensions in the following illustrations. The
atoms, represented as green spheres in the graph, can be viewed
as forming different sets of planes in the crystal (colored
lines in graph on left). For a given set of lattice plane
with an inter-plane distance of d,
the condition for a diffraction (peak) to occur can be simply
written as
2dsinq = n l
which is known as the Bragg's law, after W.L. Bragg, who
first proposed it. In the equation,l
is the wavelength of the x-ray, q
the scattering angle, and n
an integer representing the order of the diffraction peak.
The Bragg's Law is one of most important laws used for interpreting
x-ray diffraction data.
It is important to point out that although we have used atoms
as scattering points in this example, Bragg's Law applies
to scattering centers consisting of any periodic distribution
of electron density. In other words, the law holds true if
the atoms are replaced by molecules or collections of molecules,
such as colloids, polymers, proteins and virus particles.
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Powder XRD (X-ray Diffraction) is perhaps the most widely
used x-ray diffraction technique for characterizing materials.
As the name suggests, the sample is usually in a powdery form,
consisting of fine grains of single crystalline material to
be studied. The technique is used also widely for studying
particles in liquid suspensions or polycrystalline solids
(bulk or thin film materials).
The term 'powder' really means that the crytalline domains
are randomly oriented in the sample. Therefore when the 2-D
diffraction pattern is recorded, it shows concentric rings
of scattering peaks corresponding to the various d spacings
in the crystal lattice. The positions and the intensities
of the peaks are used for identifying the underlying structure
(or phase) of the material. For example, the diffraction lines
of graphite would be different from diamond even though they
both are made of carbon atoms. This phase identification is
important because the material properties are highly dependent
on structure (just think of graphite and diamond).
Powder diffraction data can be collected using either transmission
or reflection geometry, as shown below. Because the particles
in the powder sample are randomly oriented, these two methods
will yield the same data.
A powder XRD scan from a K2Ta2O6
sample is shown below as a plot of scattering intensity
vs. the scattering angle 2qor
the corresponding d-spacing. The peak positions, intensities,
widths and shapes all provide important information about
the structure of the material.

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Generally speaking thin film diffraction refers not to a
specific technique but rather a collection of XRD techniques
used to characterize thin film samples grown on substrates.
These materials have important technological applications
in microelectronic and optoelectronic devices, where high
quality epitaxial films are critical for device performance.
Thin film diffraction methods are used as important process
development and control tools, as hard x-rays can penetrate
through the epitaxial layers and measure the properties of
both the film and the substrate.
There are several special considerations for using XRD to
characterize thin film samples. First, reflection geometry
is used for these measurements as the substrates are generally
too thick for transmission. Second, high angular resolution
is required because the peaks from semiconductor materials
are sharp due to very low defect densities in the material.
Consequently, multiple bounce crystal monochromators are used
to provide a highly collimated x-ray beam for these measurements.
For example, in the Philips MRD used in the x-ray facility,
a 4-crystal monochromator made from Ge is used to produce
an incident beam with less than 5 arc seconds of angular divergence.
Basic XRD measurements made on thin film samples include:
- Precise lattice constants
measurements derived from 2q
- q scans, which
provide information about lattice mismatch between the film
and the substrate and therefore is indicative of strain
& stress
- Rocking curve measurements
made by doing a q
scan at a fixed 2q
angle, the width of which is inversely proportionally to
the dislocation density in the film and is therefore used
as a gauge of the quality of the film.
- Superlattice measurements
in multilayered heteroepitaxial structures, which manifest
as satellite peaks surrounding the main diffraction peak
from the film. Film thickness and quality can be deduced
from the data.
- Glancing incidence x-ray reflectivity
measurements, which can determine the thickness, roughness,
and density of the film. This technique does not require
crystalline film and works even with amorphous materials.
- Texture measurements--will
be discussed separately
The following graph shows the high resolution XRD data of
the supperlattice peaks on the GaN (002) reflections. Red
line denotes results of computer simulation of the structure.

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Texture measurements are used to determine the orientation
distribution of crystalline grains in a polycrystalline sample.
A material is termed textured if the grains are aligned in
a preferred orientation along certain lattice planes. One
can view the textured state of a material (typically in the
form of thin films) as an intermediate state in between a
completely randomly oriented polycrystalline powder and a
completely oriented single crystal. The texture is usually
introduced in the fabrication process (e.g. rolling of thin
sheet metal, deposition,etc.) and affect the material properties
by introducing structural anisotropy.
A texture measurement is also referred to as a pole figure
as it is often plotted in polar coordinates consisting of
the tilt and rotation angles with respect to a given crytallographic
orientation. A pole figure is measured at a fixed scattering
angle (constant d spacing) and consists of a series of f
-scans (in- plane rotation around the center of the sample)
at different tilt or Y -(azimuth) angles, as illustrated below.

The pole figure data are displayed as contour plots or elevation
graphs with zero angle in the center. Below we show two pole
figure plots using the same data set. An orientation distribution
function (ODF) can be calculated using the pole figure data.
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Structural and residual stress in materials can be determined
from precision lattice constants measurements. For polycrystalline
samples high resolution powder diffraction measurements generally
will provide adequate accuracy for stress evaluation. For
textured (oriented) and single crystalline materials, 4-circle
diffractometry is needed in which the sample is rotated so
that measurements on multiple diffraction peaks can be carried
out. The interpretation of stress measurement data is complicated
and model dependent. Consult the reference literature for
more details.
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SAXS measurements typically are concerned with scattering
angles < 1o. As dictated by Bragg's Law, the
diffraction information about structures with large d-spacings
lies in the region. Therefore the SAXS technique is commonly
used for probing large length scale structures such as high
molecular weight polymers, biological macromolecules (proteins,
nucleic acids, etc.), and self-assembled superstructures (e.g.
surfactant templated mesoporous materials).
SAXS measurements are technically challenging because of
the small angular separation of the direct beam (which is
very intense) and the scattered beam. Large specimen-to-detector
distances (0.5 m - 10 m) and high quality collimating optics
are used to achieve good signal-to-noise ratio in the SAXS
measurement.
Forvis Technologies offers cutting edge instruments for SAXS
measurements with custom designs. (see products section for more details)
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X-ray crystallography is a standard technique for solving
crystal structures. Its basic theory was developed soon after
x-rays were first discovered more than a century ago. However,
over the years it has gone through continual development in
data collection instrumentation and data reduction methods.
In recent years, the advent of synchrotron radiation sources,
area detector based data collection instruments, and high
speed computers has dramatically enhanced the efficiency of
crystallographic structural determination. Today x-ray crystallography
is widely used in materials and biological research. Structures
of very large biological machinery (e.g. protein and DNA complexes,
virus particles) have been solved using this method.
In x-ray crystallography, integrated intensities of the diffraction
peaks are used to reconstruct the electron density map within
the unit cell in the crystal. To achieve high accuracy in
the reconstruction, which is done by Fourier transforming
the diffraction intensities with appropriate phase assignment,
a high degree of completeness as well as redundancy in diffraction
data is necessary, meaning that all possible reflections are
measured multiple times to reduce systematic and statistical
error. The most efficient way to do this is by using an area
detector which can collect diffraction data in a large solid
angle. The use of high intensity x-ray sources, such as synchrotron
radiation, is an effective way to reduce data collection time.
One of the central difficulties in structural determination
using x-ray crystallography is referred to as the "phase problem",
which arises from the fact that the diffraction data contains
information only on the amplitude but not the phase of the
structure factor. Over the years many methods have been developed
to deduce the phases for reflections, including computationally
based direct methods, isomorphous replacement, and multi-wavelength
anormalous diffraction (MAD) methods.
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